High Purity TiSi Alloy Metal Targets – Titanium Silicon Sputtering Target Ingot

Ultra-High Purity Material
– Precision-engineered with 99.99% pure titanium and silicon, ensuring minimal impurities for superior thin-film deposition in semiconductor and optical coating applications.
Advanced Sputtering Performance
– Optimized grain structure and uniform composition deliver exceptional adhesion, low particle generation, and high deposition rates for consistent industrial-grade results.
Durable & Precision-Crafted
– Machined with CNC-controlled processes for flawless surface finish (Ra <0.5μm), tight dimensional tolerances (±0.1mm), and long lifespan under high-power sputtering conditions.
Versatile Industrial Applications
– Ideal for microelectronics (integrated circuits, MEMS), solar panels, wear-resistant coatings, and advanced research in nanotechnology or aerospace components.
Direct-from-Manufacturer Pricing
– Bulk orders available at globally competitive rates, backed by ISO-certified production and seamless logistics for wholesale buyers.