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High Purity FeS2 Iron Sulfide Sputtering Target For PVD Coating Material
$400$595.37-32.81%
Dimensions:
D50.8x3.175mm
Quantity:
Add to Cart
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Features
High Purity FeS2 Iron Sulfide Sputtering Target – Precision PVD Coating Solution
Ultra-pure FeS2 (99.99%+) for contamination-free thin film deposition, ensuring exceptional adhesion and uniformity in coatings. Ideal for solar cells, semiconductor devices, and optical coatings due to its optimal electrical conductivity and thermal stability. Precision-engineered with dense, crack-free microstructure for high deposition rates and minimal particle generation. Globally sourced raw materials combined with advanced sintering techniques guarantee batch-to-batch consistency. Exclusive bulk pricing for industrial buyers – scale your PVD production without compromising quality. Vacuum-sealed packaging prevents oxidation, ready for immediate integration into magnetron sputtering systems. Customizable dimensions (disc, rectangular) and purity levels available for specialized research or manufacturing needs.
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