High-Purity Cobalt Iron Sputtering Target (CoFe Alloy)

Premium Metal Alloy Material
– Precision-engineered CoFe sputtering target with optimal magnetic properties, ideal for thin-film deposition in advanced tech applications.
Ultra-High Purity & Consistency
– Manufactured under strict quality control, ensuring minimal impurities (<99.9% purity) for reliable performance in sensitive environments.
Custom OEM/ODM Solutions
– Tailored specifications available (size, shape, composition) to meet exact project requirements in research or industrial production.
Critical Industrial Applications
– Essential for semiconductor manufacturing, magnetic sensors, data storage devices, and photovoltaic coatings.
Global Wholesale Advantage
– Direct factory pricing, bulk discounts, and fast logistics for large-scale procurement needs.
Durable & Precision-Finished
– Smooth surface finish (Ra <0.5μm) and uniform grain structure for consistent sputtering performance.
Trusted Global Supplier
– Backed by rigorous testing (EDX, SEM) and compliant with international material standards.