Ultra-High Purity Aluminum Sputtering Target – Precision PVD Coating Solution

99.999% Pure Aluminum (Al) Metal
– Premium-grade sputtering target with minimal impurities for flawless thin-film deposition in critical applications.
Optimized for PVD Processes
– Uniform grain structure and dense surface ensure consistent vaporization, ideal for semiconductor, optical, and solar cell manufacturing.
Precision-Engineered Surface
– Meticulously polished to sub-micron roughness, reducing particle generation and enhancing coating adhesion in high-vacuum environments.
Versatile Industrial Applications
– Essential for creating conductive layers in microelectronics, reflective coatings for LEDs, and barrier films in flexible packaging.
Bulk Order Advantage
– Global wholesale pricing with volume discounts, ensuring cost-efficiency for R&D labs and large-scale production facilities.
Certified Material Traceability
– Fully documented composition and lot-controlled manufacturing for compliance with ISO and ASTM standards.