Feature Listing for Metal Organic Compound Hydrocarbons Vacuum Vapor Deposition Furnace
High-purity aluminum oxide ceramic chamber ensures superior thermal stability and corrosion resistance. Precision-controlled vacuum system maintains specific pressure for uniform thin-film deposition. Advanced graphite heating elements enable rapid temperature ramp-up (up to 1200°C) with ±1°C accuracy. Ideal for semiconductor manufacturing, solar cell coating, and optical device research. Modular gas inlet design supports multiple metalorganic precursors (e.g., TMIn, TMGa) for customized CVD/ALD processes. Leak-proof stainless steel flanges with double O-ring seals guarantee long-term vacuum integrity. Touchscreen PLC interface with 10 programmable recipes for repeatable industrial-grade production. Compact footprint (600×500×400mm) saves lab space while handling 8-inch wafers. Includes quartz boat holder and automatic pressure relief valve. Compatible with argon/nitrogen purge systems for oxide-free deposition. Wholesale discounts available for bulk orders—global shipping with certified CE/ROHS documentation.