High-Purity Custom Aluminum Alloy High Entropy Alloy (HEA) Sputtering Target
Ultra-pure Al-based HEA ingot for precision thin-film deposition, engineered with controlled grain structure and low oxygen content (<100ppm). Ideal for semiconductor, aerospace coating, and nanotechnology R&D applications.
Tailored Composition & Superior Consistency
Customizable AlCrFeNiMo/TiZrV variants (99.95% purity) with uniform elemental distribution. Vacuum arc melting ensures defect-free microstructure for stable sputtering performance.
Precision Machined Surfaces
Mirror-polished (Ra<0.5μm) or grooved designs available. Compatible with magnetron and ion beam systems (RF/DC).
Key Applications
- Solar cell conductive layers - Wear-resistant tool coatings - MEMS device fabrication - Quantum computing material research Bulk order discounts available. MOQ negotiable for research institutions. ISO 9001-certified production.