High-Purity SiAl Aluminum Silicon Alloy Sputter Target
Superior
aluminum-silicon (SiAl) master alloy
material engineered for precision thin-film deposition. Features
exact composition control
(custom ratios available) and ultra-low oxygen content (<100ppm) for consistent performance.
Vacuum-grade density (99.9%+)
, fine-grained structure, and mirror-polished surface (Ra<0.5μm) minimize particle ejection during sputtering. Compatible with
semiconductor, solar cell, and optical coating
applications.
Direct factory pricing
with bulk discounts—global shipping. MOQ flexible for R&D or industrial-scale orders.