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High Purity Aluminum Indium Alloy Target AlIn Alloy Sputtering Target Ingot
$360$507.64-29.08%
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Features
Ultra-Pure Aluminum Indium Alloy Sputtering Target (AlIn Alloy)
High Purity (99.99%+)
: Precision-engineered for thin-film deposition, ensuring minimal impurities and superior conductivity.
Optimized Composition
: Homogeneous AlIn alloy ingot with controlled stoichiometry for consistent sputtering performance.
Advanced Applications
: Ideal for semiconductor manufacturing, OLED displays, and solar cell coatings.
Premium Surface Finish
: Mirror-polished to reduce particle generation and enhance film adhesion.
Custom Sizes Available
: Tailored dimensions to fit most PVD systems, supporting lab-scale R&D and industrial production.
Global Bulk Supply
: Direct factory pricing for wholesale orders, backed by fast international shipping.
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Description
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